Instead of dielectric cylinder, we can obtain the mechanism for low-loss vertical confinementĪll rights reserved. Studies on various 2-D PhC waveguides conducted by other groups.
Refractive-index distribution produced in the SiO2 layer by Si-ion implantation than previous A large spot size and lower scattering loss can additionally be obtained by utilizing its gentle Planar photonic integrated circuits can be realized by using sharp-bended 2-D PhC waveguides PhC consisting of triangular lattice of air-holes because this structure possesses a large bandgapįor TE mode and air-holes are easy to handle during fabrication. Process of 2-D PhC on them by electron beam (EB) lithography. With conventional microelectronic processing, may be ion implantation and subsequent One of the most promising approaches to producing 3-D waveguide structures, compatible The integration of such structures into the existing silicon technologyĬonstitutes problem because their methods of fabrication are not compatible with the existing Method is the use of dielectric slab, which uses total internal reflection technique to confine light Many approaches have been reported in this area. In the lateral directions by PhC bandgap and using different method to confine light in the PhC structures is still a difficult process, which has resulted in using 2-D PhC to confine light
#FULL LATTICE CRYSTAL FILTER DESIGN FULL#
To be able to have a full control of lig ht in all directions, a threedimensional photonic crystal (3-D PhC) structure is required. Much attention to many researchers all over the world due to their compatibility with theĮxisting silicon technology. Silicon based photonic crystal structures for manipulating the flow of light has attracted
Integrated into the existing silicon technology for directing light from one part of the chip to The implantation of Si-ion into SiO2 with the process ofĢ-D PhCs structure can effectively guide light inside such structure, which can easily be Microscope (AFM) and annealing temperature and time were optimized in order to recover theĭamage done by Si-ion implantation. We have analyzed the fabricated sample using atomic force By analyzing the samples fabricated usingĭifferent fabrication approach we found a suitable fabrication method for 2-D PhCs based on Using finite-difference time-domain (FDTD) method. The PhCĭesign parameters based on the telecommunication wavelength (λ=1.55 µm) were obtained PhC) consisting of the silicon ion (Si-ion) implanted silicon dioxide (SiO2) layers. In this paper, we designed and fabricated two-dimensional photonic crystal (2-D Quantum Beam Science Directorate, Japan Atomic Energy Agency, Takasaki, JapanĪ b c ion implantation, silicon photonics, photonic crystals, photonic crystal waveguidesĪbstract. Shunya Yamamoto2, Aichi Inouye2, Masahito Yoshikawa2ĭepartment of Electronic Engineering, Graduate School of Engineering, Gunma University, Teruyoshi Shinagawa1, Kenta Miura1,c, Osamu Hanaizumi1,d , © (2011) Trans Tech Publications, Switzerlandĭesign and Fabrication of Novel Photonic Crystal WaveguideĬonsisting of Si-Ion Implanted SiO2 LayersĪmarachukwu Valentine Umenyi1,a, Masashi Honmi1, Shin-ya Kawashiri1,b ,
0 kommentar(er)
